Shigeru Sato

Title: Shigeru Sato: Innovator in Photosensitive Compositions

Introduction

Shigeru Sato is a notable inventor based in Minami-ashigara, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of four patents. His work has been instrumental in advancing technologies related to photosensitive compositions.

Latest Patents

Among his latest patents, Sato has developed a photosensitive composition that includes a 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound. This compound is represented by a specific general formula, where X can be a chlorine or bromine atom, and A can be a phenyl group, a naphthyl group, or a substituted phenyl or naphthyl group. Additionally, he has created a photosensitive resin composition that further enhances the capabilities of photosensitive materials.

Career Highlights

Shigeru Sato is associated with Fuji Photo Film Company, Limited, where he has contributed to various innovative projects. His expertise in photosensitive compositions has positioned him as a key figure in the development of advanced imaging technologies.

Collaborations

Throughout his career, Sato has collaborated with notable colleagues, including Akira Nagashima and Masayuki Iwasaki. These collaborations have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Shigeru Sato's work in photosensitive compositions exemplifies the impact of innovation in technology. His patents and collaborations highlight his commitment to advancing the field, making him a prominent figure in the industry.