Shigeru Otawa

Title: Shigeru Otawa: Innovator in Photopolymerizable Resin Technology

Introduction

Shigeru Otawa is a notable inventor based in Yamato, Japan. He has made significant contributions to the field of photopolymerizable resin compositions, particularly in applications suitable for printed circuit boards. With a total of 2 patents, his work has had a lasting impact on the industry.

Latest Patents

Otawa's latest patents include a photopolymerizable resin composition that employs (meth)acrylonitrile. This innovative composition is developable with an aqueous weak alkaline solution, making it particularly suitable for printed circuit board applications. Another significant patent involves a photopolymerizable composition that includes benzotriazole carboxylic acid, showcasing his expertise in developing advanced materials for electronic applications.

Career Highlights

Throughout his career, Shigeru Otawa has worked with prominent companies such as Photopoly Ohka Co., Ltd. and Tokyo Ohka Kogyo Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in photopolymer technology.

Collaborations

Otawa has collaborated with notable colleagues in the field, including Junichi Onodera and Hiroyuki Tohda. These partnerships have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Shigeru Otawa's contributions to photopolymerizable resin technology highlight his role as a key innovator in the field. His patents and collaborations reflect a commitment to advancing materials science, particularly in the electronics sector.