Tokyo, Japan

Shigeru Ono



Average Co-Inventor Count = 1.3

ph-index = 11

Forward Citations = 285(Granted Patents)


Location History:

  • Minato-ku, JP (2001)
  • Tokyo, JP (1987 - 2009)

Company Filing History:


Years Active: 1987-2009

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22 patents (USPTO):Explore Patents

Title: Shigeru Ono: Innovator in Portable Radio Technology

Introduction: Shigeru Ono, based in Tokyo, Japan, is an accomplished inventor with a remarkable portfolio consisting of 22 patents. His innovative work primarily focuses on enhancing communication technology through advancements in portable radio terminals and related methodologies.

Latest Patents: Among his latest contributions is the development of a portable radio terminal and an automatic frequency control (AFC) method. This invention aims to optimize the performance of oscillators by incorporating a unit that intermittently executes the AFC operation. It also features a mechanism designed to shorten the AFC operation stop period, particularly when significant frequency shifts occur. This dual focus on both the terminal and the AFC control method showcases Ono's expertise and commitment to improving communication efficiency.

Career Highlights: Shigeru Ono has made significant strides in his career, having worked at reputable companies such as NEC Corporation and Oki Electric Industry Co., Ltd. His tenure at these institutions has allowed him to refine his skills and contribute to impactful innovations in the field of electronics and communications.

Collaborations: Throughout his career, Ono has collaborated with notable professionals, including Mariko Matsumoto and Hiroshi Katsuragawa. These partnerships have enriched his work and led to the successful integration of diverse expertise in his projects.

Conclusion: Shigeru Ono exemplifies the spirit of innovation within the realm of portable communication technology. His numerous patents and collaborative efforts underline his commitment to advancing the field and making significant contributions that enhance user experience and technological efficiency.

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