Kanazawa, Japan

Shigeru Nozaki

This inventor holds 2 USPTO granted patents. Top assignee: Komatsu Industries Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Nozaki. Retrieved from https://idiyas.com/inventor/shigeru-nozaki-1fcbbcup

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Shigeru Nozaki - Innovator in Laser Processing Technology.

Introduction

Shigeru Nozaki is a prominent inventor based in Kanazawa, Japan. He is known for his contributions to the field of laser processing technology. With a focus on innovation, Nozaki has made significant strides in enhancing the efficiency and effectiveness of laser machines.

Latest Patents

Shigeru Nozaki holds a patent for a nozzle designed specifically for laser processing machines. This invention aims to improve the precision and performance of laser cutting and engraving applications. His innovative approach has led to advancements in the manufacturing sector.

Career Highlights

Nozaki is currently employed at Komatsu Industries Corporation, where he continues to develop cutting-edge technologies. His work at Komatsu has allowed him to collaborate with other experts in the field and contribute to the company's reputation for innovation.

Collaborations

One of his notable coworkers is Nobuhiro Takata, with whom he has worked closely on various projects. Their collaboration has fostered a creative environment that encourages the development of new ideas and technologies.

Conclusion

Shigeru Nozaki's contributions to laser processing technology exemplify the spirit of innovation. His patent for a nozzle for laser processing machines showcases his commitment to enhancing industrial applications. Through his work at Komatsu Industries Corporation, Nozaki continues to push the boundaries of technology and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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