Yokkaichi, Japan

Shigeru Nakatsuka

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Sandisk Technologies Inc.. Active years: 2022-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Nakatsuka. Retrieved from https://idiyas.com/inventor/shigeru-nakatsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022-2023

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3 patents (USPTO):Explore Patents

Title: Shigeru Nakatsuka: Innovator in Deposition Technology

Introduction

Shigeru Nakatsuka is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of deposition technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of deposition apparatuses.

Latest Patents

One of Nakatsuka's latest patents is titled "Deposition apparatus including an off-axis lift-and-rotation unit and methods for operating the same." This invention features a deposition chamber that includes a vacuum enclosure, an electrostatic chuck with a flat top surface, and a lift-and-rotation unit that is laterally offset from the vertical axis of the electrostatic chuck. The design also incorporates a gas supply manifold for gas influx and a pumping port connected to the vacuum enclosure.

Another notable patent is the "Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the same." This apparatus includes an electrostatic chuck within a vacuum enclosure, featuring multiple conductive plates embedded in the chuck. These plates can be independently electrically biased, allowing for localized modifications of chucking force and temperature control.

Career Highlights

Shigeru Nakatsuka is currently employed at SanDisk Technologies Inc., where he continues to innovate in the field of deposition technology. His work has been instrumental in advancing the capabilities of deposition apparatuses, making them more versatile and efficient.

Collaborations

Throughout his career, Nakatsuka has collaborated with notable colleagues, including Shoichi Murakami and Syo Fukata. These collaborations have contributed to the development of cutting-edge technologies in the field.

Conclusion

Shigeru Nakatsuka is a key figure in the realm of deposition technology, with a focus on innovative apparatus designs. His contributions through patents and collaborations have significantly impacted the industry, showcasing his expertise and dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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