Sakuragawa, Japan

Shigeru Kuroda

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Kuroda. Retrieved from https://idiyas.com/inventor/shigeru-kuroda-qfdf22ue

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Shigeru Kuroda: Innovator in Semiconductor Technology

Introduction

Shigeru Kuroda is a notable inventor based in Sakuragawa-mura, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and creativity have positioned him as a valuable asset in the industry.

Latest Patents

Kuroda holds a patent for a shallow trench isolation formation with sidewall spacer. This invention features an isolation structure that protrudes above the semiconductor surface, along with sidewall spacers that smooth the topography over the isolation structure. This advancement is crucial for enhancing the performance and reliability of semiconductor devices.

Career Highlights

Shigeru Kuroda is currently employed at Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to collaborate with other talented professionals and contribute to groundbreaking technologies.

Collaborations

Kuroda has worked alongside esteemed colleagues such as Yasutoshi Okuno and Ken Numata. Their combined expertise has fostered an environment of innovation and creativity within their projects.

Conclusion

Shigeru Kuroda's contributions to semiconductor technology through his patent and work at Texas Instruments Corporation highlight his role as an influential inventor. His innovative spirit continues to drive advancements in the field, making a lasting impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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