Sagamihara, Japan

Shigeru Inoue

This inventor holds 1 USPTO granted patent. Top assignee: Nidec Sankyo Corporation. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Inoue. Retrieved from https://idiyas.com/inventor/shigeru-inoue-1bergpl9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Shigeru Inoue: Innovator in Scanning Technology

Introduction

Shigeru Inoue is a prominent inventor based in Sagamihara, Japan. He is known for his contributions to scanning technology, particularly through his work at Nidec Sankyo Corporation. With a focus on innovation, Inoue has made significant strides in the field of electronics.

Latest Patents

Inoue holds a patent for a scanner, showcasing his expertise in developing advanced imaging technologies. This patent reflects his commitment to enhancing the efficiency and functionality of scanning devices.

Career Highlights

Throughout his career, Inoue has been instrumental in driving technological advancements at Nidec Sankyo Corporation. His work has not only contributed to the company's success but has also influenced the broader industry.

Collaborations

Inoue has collaborated with notable colleagues, including Teruo Matsue and Toshio Tatai. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Shigeru Inoue's contributions to scanning technology and his collaborative efforts with esteemed colleagues highlight his role as a key innovator in the field. His work continues to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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