Location History:
- Machida, JP (1995)
- Yokohama, JP (1998 - 2003)
Company Filing History:
4 out of 2,351 
2 out of 3,106 
1 out of 499 Years Active: 1995-2003
Title: Shigeo Tsuji: Innovator in Photosensitive Technology
Introduction
Shigeo Tsuji is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of photosensitive technology, holding a total of 5 patents. His work has been instrumental in advancing lithographic printing processes.
Latest Patents
Tsuji's latest patents include a photosensitive lithographic printing plate. This innovative plate features a photosensitive resin layer formed on an aluminum substrate that has undergone electrolytic surface roughening in nitric acid, followed by anodic oxidation treatment. The photosensitive resin layer is composed of a photopolymerizable composition that includes an addition-polymerizable ethylenically unsaturated bond-containing monomer, a photopolymerization initiator, and a polymer binder. Notably, the monomer contains a phosphate compound with at least one (meth)acryloyl group. Another significant patent is a photosensitive composition that consists of a compound with at least one addition-polymerizable ethylenically unsaturated double bond, an acidic vinyl copolymer soluble or swellable in alkaline water, a photopolymerization initiator, and a diazo resin. The diazo resin is a copolycondensed compound that includes an aromatic compound with a carboxyl or hydroxyl group and an aromatic diazonium compound.
Career Highlights
Throughout his career, Tsuji has worked with notable companies such as Mitsubishi Chemical Corporation and Konica Corporation. His experience in these organizations has allowed him to refine his expertise in photosensitive materials and processes.
Collaborations
Tsuji has collaborated with esteemed colleagues, including Hideaki Okamoto and Akihisa Murata. Their joint efforts have contributed to advancements in the field of lithographic printing technology.
Conclusion
Shigeo Tsuji's innovative work in photosensitive technology has made a lasting impact on the industry. His patents and collaborations reflect his dedication to advancing lithographic processes and materials.