Shigeo Irie

Title: Shigeo Irie: Innovator in Photomask Technology

Introduction

Shigeo Irie is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on the development of advanced materials and methods for photomask production, which are essential in the semiconductor manufacturing process.

Latest Patents

Irie's latest patents include innovative methods and materials for creating photomasks. One of his notable inventions is a photomask blank that consists of a transparent substrate, a first film of chromium-containing material, and a second film of silicon/oxygen-containing material. This design features a first layer contiguous to the first film and a second layer that is spaced apart, which helps control the etching rate during the manufacturing process. Another significant patent involves a photomask blank that is processed into a transmissive photomask for photolithography, utilizing materials that are specifically designed to withstand chlorine/oxygen-based dry etching.

Career Highlights

Shigeo Irie is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the field of photomask technology. His expertise and contributions have positioned him as a key figure in the development of materials that enhance the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Throughout his career, Irie has collaborated with notable colleagues, including Takuro Kosaka and Hideo Kaneko. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Shigeo Irie's work in photomask technology exemplifies the importance of innovation in the semiconductor industry. His patents and contributions continue to influence the development of advanced manufacturing techniques.