Settsu, Japan

Shigeo Daimon


Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 60(Granted Patents)


Location History:

  • Osaka, JP (1981 - 1994)
  • Osaki, JP (1995)
  • Settsu, JP (1993 - 1997)

Company Filing History:


Years Active: 1981-1997

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13 patents (USPTO):Explore Patents

Title: Shigeo Daimon: Innovator in Magnetic Materials

Introduction

Shigeo Daimon is a prominent inventor based in Settsu, Japan. He has made significant contributions to the field of magnetic materials, holding a total of 13 patents. His work focuses on the development of innovative materials that have practical applications in various industries.

Latest Patents

One of Daimon's latest patents involves the creation of acicular metal iron fine particles and the process for preparing them. This invention provides acicular fine particles composed of iron and carbon. These particles can be prepared by contacting acicular iron carbide fine particles with a reducing agent that contains no carbon atoms. Additionally, the invention includes a magnetic coating composition and a magnetic recording medium that incorporates these acicular metal iron fine particles. Another notable patent pertains to coated acicular fine particulate materials and the processes for preparing them.

Career Highlights

Throughout his career, Shigeo Daimon has worked with notable companies such as Daikin Industries, Ltd. and Daikin Kogyo Co., Ltd. His experience in these organizations has allowed him to refine his expertise in material science and innovation.

Collaborations

Daimon has collaborated with several talented individuals in his field, including Yoshiyuki Shibuya and Takuya Arase. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Shigeo Daimon is a distinguished inventor whose work in magnetic materials has led to numerous patents and innovations. His contributions continue to impact various industries, showcasing the importance of research and development in advancing technology.

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