Company Filing History:
Years Active: 2017-2025
Title: Shigemi Oono: Innovator in Substrate Treatment Technologies
Introduction
Shigemi Oono is a notable inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate treatment technologies, holding a total of 2 patents. His work focuses on enhancing the efficiency and safety of various processing apparatuses.
Latest Patents
Oono's latest patents include a monitoring system for a sealing apparatus that utilizes a laser sensor. This system is designed to monitor a sealed space between a housing and a substrate treatment apparatus. The laser sensor scans the detection region and provides control signals based on its findings. Another patent involves a liquid processing apparatus that holds a circular substrate and rotates it while applying a chemical liquid to remove unwanted films. An image capture unit assesses the effectiveness of the removal process, ensuring optimal results.
Career Highlights
Shigemi Oono is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His innovative work has contributed to advancements in substrate processing technologies, making significant impacts in the field.
Collaborations
Oono has collaborated with talented individuals such as Shota Kaneko and Norihide Sagara, who have supported his innovative endeavors.
Conclusion
Shigemi Oono's contributions to substrate treatment technologies through his patents and work at Tokyo Electron Limited highlight his role as a key innovator in the industry. His advancements continue to influence the efficiency and safety of processing apparatuses.