This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Shigeki Takishima: Innovator in Semiconductor Manufacturing
Introduction
Shigeki Takishima is a notable inventor based in Hiroshima, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique method that enhances the efficiency of semiconductor devices.
Latest Patents
Shigeki Takishima holds a patent for a method of manufacturing semiconductor devices. This patent describes a process where a polyimide film is effectively formed on complicated surfaces. The film is created by reacting diamine monomer and tetracarboxylic acid dianhydride monomer, both dissolved in supercritical carbon dioxide, along with a polyamic acid that results from the reaction of these monomers.
Career Highlights
Throughout his career, Takishima has focused on advancing semiconductor technology. His work has been instrumental in improving the manufacturing processes that are critical for the production of high-performance electronic devices. His innovative methods have garnered attention in the industry.
Collaborations
Shigeki Takishima has collaborated with notable colleagues, including Hiroyuki Ode and Masashi Haruki. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor field.
Conclusion
Shigeki Takishima's contributions to semiconductor manufacturing highlight his role as an innovator in the industry. His patented methods are paving the way for advancements in technology that will benefit various applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile