Shigeki Amemiya

Title: Shigeki Amemiya – Innovator in Substrate Processing Technology

Introduction

Shigeki Amemiya is a prominent inventor based in Miyagi, Japan, known for his innovative contributions to substrate processing technology. With a total of two patents to his name, Amemiya has made significant strides in creating efficient methods and apparatuses for the treatment of substrates in various applications.

Latest Patents

Amemiya's latest patents include a "Purging Apparatus and Purging Method for Substrate Storage Container" and a "Method for Purging a Substrate Container." The purging apparatus features an upper nozzle designed to supply dry gas obliquely to the substrate storage container, and side nozzles that effectively deliver dry gas from outside the container into its interior. This design ensures comprehensive coverage of the container during the purging process. The method for purging a substrate container emphasizes a systematic approach where a cover is opened only after a dry gas is supplied, minimizing the risk of contamination.

Career Highlights

Shigeki Amemiya is currently associated with Tokyo Electron Limited, a well-respected name in the semiconductor manufacturing industry. His contributions to substrate processing technologies have positioned him as a key innovator within the company, supporting advancements that benefit various aspects of semiconductor production.

Collaborations

Throughout his career, Amemiya has collaborated with notable colleagues, including Seiichi Kaise and Shinobu Onodera. These collaborations have allowed for a richer exchange of ideas and have furthered the development of innovative solutions in substrate processing.

Conclusion

Shigeki Amemiya continues to push the boundaries of substrate processing technology. With his patents showcasing inventive methods and apparatuses, he plays a critical role in advancing the efficiency and effectiveness of substrate treatment, marking him as a significant figure in the field of semiconductor innovation.