This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Iflytek Co., Ltd.. Active years: 2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023
Title: Shifu Xiong: Innovator in End-to-End Modeling
Introduction
Shifu Xiong is a prominent inventor based in Hefei, China. He has made significant contributions to the field of modeling through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of end-to-end modeling systems.
Latest Patents
Shifu Xiong holds a patent for an "End-to-end modeling method and system." This invention provides a comprehensive method and system for end-to-end modeling. The method includes determining a topological structure of a target-based end-to-end model, which consists of an input layer, an encoding layer, a code enhancement layer, a filtering layer, a decoding layer, and an output layer. The code enhancement layer adds information of a target unit to a feature sequence outputted by the encoding layer, while the filtering layer filters a feature sequence that has been enhanced with the target unit's information. Additionally, the method involves collecting multiple pieces of training data and training the parameters of the target-based end-to-end model using this data. Shifu Xiong has 1 patent to his name.
Career Highlights
Throughout his career, Shifu Xiong has worked with notable organizations, including Iflytek Co., Ltd. and the University of Science and Technology of China. His experience in these institutions has allowed him to develop and refine his innovative ideas in modeling.
Collaborations
Shifu Xiong has collaborated with esteemed colleagues such as Jia Pan and Shiliang Zhang. Their joint efforts have contributed to advancements in the field of end-to-end modeling.
Conclusion
Shifu Xiong is a distinguished inventor whose work in end-to-end modeling has the potential to impact various industries. His innovative approach and dedication to research continue to inspire advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
