Company Filing History:
Years Active: 2007
Title: Shifang Ll: Innovator in Optical Metrology
Introduction
Shifang Ll is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of optical metrology, particularly in the optimization of measurement models for wafer structures. His innovative approach has led to the development of a patented technology that enhances the accuracy and efficiency of optical measurements.
Latest Patents
Shifang Ll holds a patent titled "Optical metrology model optimization based on goals." This patent focuses on the optimization of an optical metrology model for measuring wafer structures. The process involves developing a model with specific metrology variables, selecting goals for optimization, and determining fixed values for certain parameters. The optimized model is then used to obtain measurements, ensuring that specific termination criteria are met.
Career Highlights
Shifang Ll is currently employed at Timbre Technologies, Inc., where he continues to advance his research and development in optical metrology. His work has been instrumental in improving measurement techniques that are critical in various technological applications.
Collaborations
Shifang collaborates with talented individuals such as Vi Vuong and Emmanuel Drege, contributing to a dynamic team focused on innovation in optical technologies.
Conclusion
Shifang Ll's contributions to optical metrology exemplify the impact of innovative thinking in technology. His patented work not only enhances measurement accuracy but also sets a foundation for future advancements in the field.