Shichen Gu

Title: Shichen Gu: Innovator in Charged-Particle Beam Technology

Introduction

Shichen Gu is a prominent inventor based in San Jose, California. He has made significant contributions to the field of charged-particle beam technology. His innovative work focuses on enhancing imaging resolution through advanced systems and methods.

Latest Patents

Shichen Gu holds a patent for a "Multiple charged-particle beam apparatus with low crosstalk." This invention discloses systems and methods aimed at improving imaging resolution by minimizing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus. The multi-beam apparatus includes an electro-optical system featuring a beam-limit aperture plate. This plate has a surface that is substantially perpendicular to an optical axis, with a first aperture at a first distance and a second aperture at a different distance from the surface of the beam-limit aperture plate. The design of these apertures is crucial for the functionality of the apparatus.

Career Highlights

Shichen Gu is currently employed at ASML Netherlands B.V., where he continues to develop innovative technologies in the field. His work has led to advancements that are essential for various applications in imaging and detection.

Collaborations

Shichen collaborates with notable colleagues, including Weiming Ren and Qingpo Xi. Their combined expertise contributes to the success of their projects and innovations.

Conclusion

Shichen Gu is a key figure in the advancement of charged-particle beam technology. His patent and ongoing work at ASML Netherlands B.V. highlight his commitment to innovation in this specialized field.