This inventor holds 3 USPTO granted patents. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 1998-2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo-To, JP (1998 - 2004)
- Tokyo, JP (2005)
Company Filing History:
Years Active: 1998-2005
Title: Shiaki Murai: Innovator in Defect Inspection and Electron Beam Control
Introduction
Shiaki Murai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical inspection and electron beam technology. With a total of 3 patents, his work has advanced the capabilities of defect detection in phase shift masks and electron beam control devices.
Latest Patents
One of Murai's latest patents is a defect inspection apparatus for phase shift masks. This invention relates to a method capable of detecting phase shifter defects that conventional inspection techniques cannot identify. By utilizing an optical method and comparing electric signals, the apparatus inspects defects from the mask transparent substrate side. Light is applied to the phase shift mask, and reflection images from different phase shifter pattern regions are captured. The image signals are then compared to detect defects based on signal differences.
Another notable patent is an electron beam control device. This device is designed to control an electron beam for applications such as electron beam exposure devices. It ensures that the track of the electron beam is not adversely influenced by magnetic variations from surrounding influences. The device includes a magnetometric sensor that measures the amount of magnetic variation affecting the electron beam's track.
Career Highlights
Shiaki Murai is currently employed at Dai Nippon Printing Co., Ltd., where he continues to innovate in his field. His work has been instrumental in enhancing the precision and reliability of defect inspection and electron beam applications.
Collaborations
Murai has collaborated with notable coworkers, including Kazuaki Yamamoto and Shigeru Noguchi. Their combined expertise has contributed to the successful development of advanced technologies in their respective fields.
Conclusion
Shiaki Murai's contributions to defect inspection and electron beam control highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving the efficiency and accuracy of inspection methods in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile