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Title: Innovations of Inventor Shi Xu
Introduction
Shi Xu is a notable inventor based in Singapore, SG. She has made significant contributions to the field of plasma processing technology. With a total of 2 patents, her work focuses on enhancing the efficiency and effectiveness of plasma processing devices.
Latest Patents
One of her latest patents is a plasma processing apparatus with a real-time particle filter. This innovative device includes a plasma generation unit that utilizes a cathodic arc discharge to generate plasma. It features first and second magnetic field ducts arranged in a row for transporting the plasma, with a processing chamber connected at the other end. The processing chamber is equipped with a stage for holding a substrate to be processed. A movable shutter is incorporated to cover the plasma during specific time periods after the start or before the end of the arc discharge. This shutter is designed to be electrically insulated from the processing chamber.
Another significant patent by Shi Xu is also related to plasma processing devices that utilize low-pressure arc discharge. This invention addresses the need for efficiently capturing and removing electrically charged particles and neutral particles with a diameter of up to 5 µm. The solution involves installing an electric field filter in the plasma transportation course, which has a cylindrical structure with an uneven inner wall shape. A voltage ranging from 10 to 90 V is applied to this electric field filter, enhancing its efficiency in capturing charged particles. Additionally, a neutral filter is employed to capture neutral particles effectively.
Career Highlights
Throughout her career, Shi Xu has worked with prominent companies, including Hitachi, Ltd. Her experience in these organizations has contributed to her expertise in plasma processing technologies.
Collaborations
Shi Xu has collaborated with notable professionals in her field, including Hiroshi Inaba and Shinji Sasaki. These collaborations have further enriched her work and innovations.
Conclusion
Shi Xu's contributions to plasma processing technology through her patents demonstrate her innovative spirit and dedication to advancing the field. Her work continues to influence the development of efficient plasma processing devices.
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