Company Filing History:
Years Active: 1994-2004
Title: Innovations of Shi-Qing Wang in Microelectronics
Introduction
Shi-Qing Wang is a prominent inventor based in Campbell, CA (US), known for his significant contributions to the field of microelectronics. With a total of 6 patents, Wang has developed innovative processes that enhance the performance and efficiency of integrated circuits.
Latest Patents
One of Wang's latest patents focuses on integrated circuits with multiple low dielectric-constant inter-metal dielectrics. This invention provides processes for the formation of structures in microelectronic devices, particularly in the creation of vias, interconnect metallization, and wiring lines. The use of two or more dissimilar low-k dielectrics in Cu-based dual damascene backends of integrated circuits offers exceptional performance due to lower parasitic capacitance. Another notable patent involves the process of using siloxane dielectric films in the integration of organic dielectric films in electronic devices. This invention produces dual layered dielectric films that are crucial for the manufacture of integrated circuits.
Career Highlights
Throughout his career, Shi-Qing Wang has worked with notable companies such as AlliedSignal Inc. and National Semiconductor Corporation. His expertise in microelectronics has led to advancements that are widely recognized in the industry.
Collaborations
Wang has collaborated with esteemed colleagues, including Henry Chung and James Lin, contributing to the development of innovative technologies in microelectronics.
Conclusion
Shi-Qing Wang's contributions to the field of microelectronics through his patents and collaborations have significantly advanced the technology used in integrated circuits. His work continues to influence the industry and pave the way for future innovations.