This inventor holds 1 USPTO granted patent. Top assignee: Lam Research Company. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Sheung Kan Tsang: Innovator in Semiconductor Cleaning Processes
Introduction
Sheung Kan Tsang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the semiconductor industry, particularly in the area of cleaning processes for dry etchers. His innovative approach has led to advancements that enhance production efficiency and tool performance.
Latest Patents
One of Tsang's key inventions is the "Waferless Clean Process of a Dry Etcher." This patent outlines a method that eliminates the need for dummy wafers during the cleaning process. The process involves removing a batch of production wafers from the dry etcher chamber and automatically initiating waferless plasma cleaning when specific process factors meet preset conditions. This innovation not only extends the meantime between wet cleans (MTBC) but also stabilizes chamber conditions, improves process performance, and increases tool uptime and throughput. The invention is particularly advantageous as it does not require an operator and can accommodate different types of products.
Career Highlights
Tsang is currently employed at Lam Research Company, a leader in semiconductor manufacturing equipment. His work at Lam Research has positioned him at the forefront of technological advancements in the industry.
Collaborations
Throughout his career, Tsang has collaborated with esteemed colleagues such as Ta-Chin Chen and Wen-Ruey Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Sheung Kan Tsang's contributions to the semiconductor field, particularly through his waferless cleaning process, demonstrate his commitment to innovation and efficiency. His work continues to influence the industry positively, paving the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile