Zhongli, Taiwan

Sheue R Lee

This inventor holds 1 USPTO granted patent. Top assignee: Everlight USA, Inc.. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sheue R Lee. Retrieved from https://idiyas.com/inventor/sheue-r-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1997

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Sheue R Lee: Innovator in Black Reactive Dye Composition

Introduction: Sheue R Lee is a notable inventor based in Zhongli, Taiwan. He has made significant contributions to the field of dye chemistry, particularly with his innovative work on black reactive dye compositions. His expertise and creativity have led to advancements that benefit various dyeing processes.

Latest Patents: Sheue R Lee holds 1 patent for a black reactive dye composition. This composition comprises a black reactive dye of a specific formula and multiple mono azo reactive dyes. It is designed for various applications, including exhaust dyeing, printing, discharge printing, and continuous dyeing.

Career Highlights: Lee is currently associated with Everlight USA, Inc., where he continues to develop and refine his innovative dye compositions. His work has garnered attention in the textile industry, showcasing his ability to blend chemistry with practical applications.

Collaborations: He has collaborated with fellow inventor Huei Ching Huang, contributing to the advancement of dye technology and enhancing the capabilities of their respective projects.

Conclusion: Sheue R Lee's contributions to the field of dye chemistry, particularly through his patented black reactive dye composition, highlight his role as an innovator in the industry. His work continues to influence dyeing processes and applications, showcasing the importance of innovation in textile chemistry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…