Silver Spring, MD, United States of America

Sheridan Neimark

This inventor holds 1 USPTO granted patent. Top assignee: Nevamar Corporation, LLP. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sheridan Neimark. Retrieved from https://idiyas.com/inventor/sheridan-neimark

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: Sheridan Neimark: Innovator in Scuff-Resistant Laminates

Introduction

Sheridan Neimark is a notable inventor based in Silver Spring, MD (US). He has made significant contributions to the field of decorative laminates, particularly in enhancing their durability and resistance to wear.

Latest Patents

Neimark holds a patent for scuff and abrasion-resistant laminates. This innovation improves the scuff-resistance and rub-resistance of decorative laminate by incorporating finely divided polyethylene wax into the surface of the decor paper. The particle size of the wax ranges from 1 to 30 microns, which significantly enhances the laminate's performance.

Career Highlights

Sheridan Neimark is associated with Nevamar Corporation, LLP, where he has applied his expertise in developing advanced laminate solutions. His work has contributed to the company's reputation for producing high-quality decorative surfaces.

Collaborations

Throughout his career, Neimark has collaborated with notable colleagues, including Israel S. Ungar and Robin D. O'Dell. These partnerships have fostered innovation and the development of new technologies in the laminate industry.

Conclusion

Sheridan Neimark's contributions to the field of decorative laminates demonstrate his commitment to innovation and quality. His patent for scuff and abrasion-resistant laminates showcases his ability to enhance product performance and durability.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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