Beijing, China

Shengkai Wang

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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6 patents (USPTO):

Title: Shengkai Wang: Innovator in Microwave Plasma Technology

Introduction

Shengkai Wang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of microwave plasma technology, holding a total of 6 patents. His innovative approaches have paved the way for advancements in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Method for manufacturing grooved MOSFET device based on two-step microwave plasma oxidation." This method involves etching a grooved gate and oxidizing silicon carbide on the surface of the grooved gate to silicon dioxide using microwave plasma. The process includes several steps, such as placing a silicon carbide substrate in a microwave plasma generating device and performing both low-temperature and high-temperature plasma oxidation to achieve a predetermined thickness of silicon dioxide.

Another notable patent is "Microwave plasma equipment and method of exciting plasma." This invention includes a plasma reaction device with a cavity, gradient electrodes to generate a gradient electric field, a gas supply device for introducing gas, and a microwave generating device to produce and transmit microwave energy into the cavity.

Career Highlights

Shengkai Wang is affiliated with the Chinese Academy of Sciences, where he conducts his research and development. His work has been instrumental in enhancing the efficiency and effectiveness of plasma technology in various applications.

Collaborations

He collaborates with talented individuals such as Xinyu Liu and Yidan Tang, contributing to a dynamic research environment that fosters innovation and discovery.

Conclusion

Shengkai Wang's contributions to microwave plasma technology exemplify the spirit of innovation. His patents reflect a commitment to advancing the field and improving manufacturing processes. His work continues to inspire future developments in semiconductor technology.

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