Sheng-Yung Chen

Title: Innovations of Sheng-Yung Chen in Patterning Systems

Introduction

Sheng-Yung Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of patterning systems, particularly through his innovative patent. His work focuses on enhancing the fidelity of patterning systems, which is crucial in various technological applications.

Latest Patents

Sheng-Yung Chen holds a patent titled "Method and apparatus for designing patterning system based on patterning fidelity." This patent presents a method that directly incorporates patterning fidelity into the design of a patterning system. The process involves simulating the production result of a target pattern according to a set of design parameters to obtain a simulated pattern. By comparing the target pattern with the simulated pattern, a patterning fidelity is determined. Subsequently, the design parameters of the patterning system are adjusted to optimize the values based on a target patterning fidelity. This innovative approach enhances the efficiency and accuracy of patterning systems.

Career Highlights

Sheng-Yung Chen is affiliated with National Taiwan University, where he contributes to research and development in his field. His expertise in patterning systems has positioned him as a valuable asset in academic and technological circles.

Collaborations

Some of his notable coworkers include Kuen-Yu Tsai and Hoi-Tou Ng. Their collaborative efforts in research have further advanced the understanding and application of patterning systems.

Conclusion

Sheng-Yung Chen's contributions to the field of patterning systems through his innovative patent demonstrate his commitment to advancing technology. His work not only enhances the design of patterning systems but also sets a foundation for future innovations in the industry.