The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
May. 23, 2012
Kuen-yu Tsai, Taipei, TW;
Sheng-yung Chen, Taipei, TW;
Hoi-tou NG, Taipei, TW;
Shiau-yi MA, Taipei, TW;
Kuen-Yu Tsai, Taipei, TW;
Sheng-Yung Chen, Taipei, TW;
Hoi-Tou Ng, Taipei, TW;
Shiau-Yi Ma, Taipei, TW;
National Taiwan University, Taipei, TW;
Abstract
A method which directly incorporates patterning fidelity into the design of a patterning system is provided. A production result of a target pattern is simulated according to a set of design parameters to obtain a simulated pattern. The target pattern is compared with the simulated pattern to obtain a patterning fidelity, and the values of the set of design parameters of the patterning system are adjusted according to a target patterning fidelity to optimize the values of the set of design parameters of the patterning system.