Kaohsiung, Taiwan

Sheng Wei Lin

This inventor holds 1 USPTO granted patent. Top assignee: Eternal Materials Co., Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sheng Wei Lin. Retrieved from https://idiyas.com/inventor/sheng-wei-lin-d1f0zfbv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovations of Sheng Wei Lin in Coating Technology.

Introduction

Sheng Wei Lin is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of coating technology, particularly in enhancing light transmittance through innovative compositions.

Latest Patents

Sheng Wei Lin holds a patent for a "Coating composition for enhancing light transmittance and coating layer formed therefrom." This invention relates to a unique coating composition that utilizes at least two types of inorganic particles with specific particle sizes. By forming a geometric stack, the invention increases the porosity of the coating layer, thereby reducing its optical refractive index and enhancing light transmittance.

Career Highlights

Sheng Wei Lin is associated with Eternal Materials Co., Ltd., where he applies his expertise in developing advanced coating solutions. His work has been instrumental in improving the performance of various materials used in optical applications.

Collaborations

Some of his notable coworkers include Mao Jung Yeh and Chien Chen Wu, who have collaborated with him on various projects within the company.

Conclusion

Sheng Wei Lin's innovative work in coating technology exemplifies the impact of scientific advancements on enhancing material properties. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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