This inventor holds 6 USPTO granted patents and 5 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Industrial Technology Research Institute. Active years: 2004-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
5 out of 42,926 
1 out of 9,308 
Years Active: 2004-2026
Title: The Innovations of Sheng-Min Wang
Introduction
Sheng-Min Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the semiconductor industry. With a total of 6 patents to his name, Wang's work has had a substantial impact on the efficiency and precision of optical systems.
Latest Patents
Wang's latest patents include innovative methods aimed at improving tool matching in photolithography. One notable patent is titled "Tool mismatch reduction using aberration map of the tools." This method involves determining aberration maps of multiple optical systems from different scanner tools. By generating a photoresist pattern through these systems, Wang's approach minimizes critical dimension variations in the photoresist patterns on substrates. Another significant patent is "Method and system to introduce bright field imaging at stitching area of high-NA EUV exposure." This patent utilizes a double exposure EUV photolithography process, employing two bright field reticles that overlap in their exposure areas, enhancing imaging quality.
Career Highlights
Throughout his career, Sheng-Min Wang has worked with leading organizations in the semiconductor sector. He has been associated with Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His expertise in photolithography and optical systems has positioned him as a key figure in advancing semiconductor manufacturing technologies.
Collaborations
Wang has collaborated with notable professionals in his field, including Ken-Hsien Hsieh and Shih-Ming Chang. These collaborations have further enriched his research and development efforts, leading to innovative solutions in photolithography.
Conclusion
Sheng-Min Wang's contributions to the field of photolithography and his innovative patents demonstrate his commitment to advancing semiconductor technology. His work continues to influence the industry, paving the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile