Hsinchu, Taiwan

Sheng-Min Wang

USPTO Granted Patents = 5 

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004-2025

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5 patents (USPTO):Explore Patents

Title: The Innovations of Sheng-Min Wang

Introduction

Sheng-Min Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the semiconductor industry. With a total of 5 patents to his name, Wang's work has had a substantial impact on the efficiency and precision of optical systems.

Latest Patents

Wang's latest patents include innovative methods aimed at improving tool matching in photolithography. One notable patent is titled "Tool mismatch reduction using aberration map of the tools." This method involves determining aberration maps of multiple optical systems from different scanner tools. By generating a photoresist pattern through these systems, Wang's approach minimizes critical dimension variations in the photoresist patterns on substrates. Another significant patent is "Method and system to introduce bright field imaging at stitching area of high-NA EUV exposure." This patent utilizes a double exposure EUV photolithography process, employing two bright field reticles that overlap in their exposure areas, enhancing imaging quality.

Career Highlights

Throughout his career, Sheng-Min Wang has worked with leading organizations in the semiconductor sector. He has been associated with Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His expertise in photolithography and optical systems has positioned him as a key figure in advancing semiconductor manufacturing technologies.

Collaborations

Wang has collaborated with notable professionals in his field, including Ken-Hsien Hsieh and Shih-Ming Chang. These collaborations have further enriched his research and development efforts, leading to innovative solutions in photolithography.

Conclusion

Sheng-Min Wang's contributions to the field of photolithography and his innovative patents demonstrate his commitment to advancing semiconductor technology. His work continues to influence the industry, paving the way for future innovations.

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