Sheng-Lie Yeh

Title: Innovations by Sheng-Lie Yeh in Holography

Introduction

Sheng-Lie Yeh is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of holography, particularly in the development of advanced dot matrix holograms. With a total of two patents to his name, his work showcases innovative techniques that enhance the functionality and aesthetic appeal of holographic images.

Latest Patents

Sheng-Lie Yeh's latest patents include a "Dot matrix hologram with a hidden image" and a "Dot matrix hologram for hiding a moire pattern." The first patent introduces a dot matrix hologram that incorporates hidden image technology, which has traditionally been used in conventional holograms. This innovation allows for the display of hidden images through illuminating laser light, utilizing different working principles compared to conventional holograms. The second patent addresses the issue of moire patterns in dot matrix holograms. It presents a method for hiding moire patterns by interlacing bright and dark lines, effectively improving the hidden effects of these patterns.

Career Highlights

Sheng-Lie Yeh is currently employed at Ahead Optoelectronics, Inc., where he continues to push the boundaries of holographic technology. His work has garnered attention for its unique approach to solving common challenges in the field, particularly regarding the visibility of hidden images and moire patterns.

Collaborations

Sheng-Lie Yeh collaborates with talented individuals such as Hsiu-Hung Lin and Jie-Tsuen Lan. Their combined expertise contributes to the innovative projects at Ahead Optoelectronics, Inc.

Conclusion

Sheng-Lie Yeh's contributions to holography through his patents demonstrate his commitment to innovation and excellence in the field. His work not only enhances the functionality of holograms but also paves the way for future advancements in optical technologies.