The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2001
Filed:
Sep. 30, 1999
Ahead Optoelectronics, Inc., Taipei Hsien, TW;
Abstract
A moire pattern technology about a dot matrix hologram for hiding a moire pattern is invented. In the moire pattern hidden region of a dot matrix hologram, the moire pattern foreground area and the moire pattern background area are formed identically by interlacing bright lines and dark lines. While position shifting is formed between the lines of the two areas. This position shifting is several times of the size of the grating dots. Thus, a moire pattern hidden in the moire pattern hidden region without being processed specially has a poor hiding ability. Often the above moire pattern can be identified by eyes directly without using a decoding film. Therefore, such kinds of moire patterns have poor hidden effects. However, the moire pattern of the present invention can prevent the aforesaid phenomenon by a well designed pretended pattern. Moreover, the appearance of such a dot matrix hologram can be beautified by the addition of the pretended patern. Furthermore, in the present invention, a technology of one-dimensional moire patterns is upgraded to a technology of two-dimensional moire patterns.