Sheng Lei

Title: Innovations of Sheng Lei

Introduction

Sheng Lei is a prominent inventor based in Beijing, China. He has made significant contributions to the fields of photolithography and communication technologies. With a total of three patents to his name, Sheng Lei continues to push the boundaries of innovation.

Latest Patents

One of his latest patents is the "Vertical motion protection method and device based on dual-stage motion system of photolithography machine." This invention discloses a method that calculates the coordinates of measured points on a micro-motion stage and determines the maximum height of the stage to ensure operational safety. If the maximum height exceeds a predetermined threshold, the system shuts down to prevent damage.

Another notable patent is the "BWP allocation method, apparatus, electronic device and computer-readable storage medium." This invention relates to communication technologies and involves acquiring service-related information from base stations to configure bandwidth parts (BWP) effectively. The method aims to enhance network throughput while reducing energy consumption, catering to various service requirements and user capabilities.

Career Highlights

Sheng Lei has worked with esteemed organizations such as Tsinghua University and Samsung Electronics Co., Ltd. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Throughout his career, Sheng Lei has collaborated with notable colleagues, including Kaiming Yang and Rong Cheng. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Sheng Lei's contributions to innovation, particularly in photolithography and communication technologies, highlight his role as a leading inventor. His patents reflect a commitment to enhancing technology and improving operational safety and efficiency.