Sheng-Hone Zheng

Title: Innovations by Sheng-Hone Zheng

Introduction

Sheng-Hone Zheng is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on methods for manufacturing gate dielectric layers, which are crucial in the fabrication of electronic devices.

Latest Patents

Sheng-Hone Zheng holds a patent titled "Method for manufacturing gate dielectric layer." This patent describes a method that involves providing a substrate divided into high voltage and low voltage circuit regions. A first dielectric layer is formed on the substrate, followed by the creation of a mask layer. The process includes patterning the mask layer, dielectric layer, and substrate to form trenches, which are then filled with an isolation layer. The method allows for the selective removal of layers to expose the necessary surfaces for further processing. This innovation enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Sheng-Hone Zheng is associated with Powerchip Semiconductor Corporation, where he applies his expertise in semiconductor technology. His work has contributed to advancements in the manufacturing processes used in the industry. Zheng's innovative approach has positioned him as a valuable asset in his field.

Collaborations

Sheng-Hone Zheng has collaborated with notable colleagues, including Wen-Ji Chen and Tung-Po Chen. These collaborations have fostered a productive environment for innovation and development within their projects.

Conclusion

Sheng-Hone Zheng's contributions to semiconductor technology, particularly through his patent on gate dielectric layer manufacturing, highlight his role as an influential inventor. His work continues to impact the industry positively.