This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Wistron Neweb Corporation. Active years: 2012.
Company Filing History:
Years Active: 2012
Title: Innovations of Sheng-Chieh Chang
Introduction
Sheng-Chieh Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of antenna technology, holding a total of 2 patents. His work focuses on innovative methods for manufacturing and forming antenna structures.
Latest Patents
Chang's latest patents include a "Method for manufacturing antenna" and a "Method for forming antenna structure." The first patent outlines a process that begins with providing a substrate with an antenna region. The substrate's surface is electroless plated with a metal medium, followed by the application of a resist. A portion of the resist is then removed, allowing for electroplating of the antenna region to form the antenna main body. Finally, the remaining resist is removed, along with excess metal medium outside the antenna region. The second patent describes a method that involves providing a non-conductive frame, applying a plating resist material, and creating a roughened surface through laser marking. This is followed by forming a medium layer and a metal layer on the frame.
Career Highlights
Sheng-Chieh Chang is currently employed at Wistron Neweb Corporation, where he continues to develop innovative antenna technologies. His expertise in this area has led to advancements that enhance the performance and manufacturing processes of antennas.
Collaborations
Chang has collaborated with notable colleagues, including Wen-Kuei Lo and Bau-Yi Huang, contributing to a dynamic work environment that fosters innovation.
Conclusion
Sheng-Chieh Chang's contributions to antenna technology through his patents and work at Wistron Neweb Corporation highlight his role as a significant inventor in the field. His innovative methods are paving the way for advancements in antenna manufacturing and design.