Vernon, CT, United States of America

Shek C Hong

This inventor holds 1 USPTO granted patent. Top assignee: Anocoil Corporation. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shek C Hong. Retrieved from https://idiyas.com/inventor/shek-c-hong-kn109yde

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Shek C Hong: Innovator in Photopolymerizable Coating Compositions

Introduction

Shek C Hong is a notable inventor based in Vernon, Connecticut, recognized for his contributions to the field of photopolymerizable coating compositions. With a focus on enhancing lithographic printing processes, his work has significant implications for the printing industry.

Latest Patents

Shek C Hong holds a patent for a "Photopolymerizable coating composition and lithographic printing plate." This invention provides photopolymerizable coating compositions that include a photosensitive compound and an ethylenically unsaturated, urethane-containing, self-crosslinkable grafted cellulose ester polymer. The compositions are designed to be sensitive to radiant energy, making them suitable for imaging elements used in offset printing processes.

Career Highlights

Hong is associated with Anocoil Corporation, where he has applied his expertise in developing innovative coating solutions. His work has contributed to advancements in printing technology, showcasing his commitment to innovation in the field.

Collaborations

Some of his notable coworkers include Robert F Gracia and William J Ryan, who have collaborated with him on various projects within the company.

Conclusion

Shek C Hong's contributions to photopolymerizable coating compositions highlight his role as an innovator in the printing industry. His patent reflects a significant advancement in lithographic printing technology, demonstrating the impact of his work.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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