Company Filing History:
Years Active: 2008-2011
Title: Sheila Tandon: Innovator in Barrier Coatings and Semiconductor Technologies
Introduction
Sheila Tandon is a prominent inventor based in Niskayuna, NY (US). She has made significant contributions to the fields of barrier coatings and semiconductor technologies. With a total of 4 patents, her work has had a substantial impact on the industry.
Latest Patents
One of her latest patents is a method for making a graded barrier coating. This method relates to graded-composition barrier coatings that comprise first and second materials in distinct zones. The compositions of these zones vary continuously across their thickness to achieve improved properties such as barrier effectiveness, flexibility, adhesion, optics, thickness, and tact time. These coatings are particularly useful in preventing exposure of devices, such as organic electro-luminescent devices (OLEDs), to reactive environmental species.
Another notable patent involves the integration of buried oxide layers with crystalline layers. This method presents a way to form a buried oxide/crystalline III-V semiconductor dielectric stack. It includes providing a substrate and forming a layered structure with different materials, one of which is an oxidizable material to create buried low index oxide layers. The method outlines a series of oxidizing steps that involve temperature increases in the presence of steam, ultimately leading to the formation of these buried layers.
Career Highlights
Throughout her career, Sheila has worked with notable companies, including General Electric Company and Ge Homeland Protection, Inc. Her experience in these organizations has allowed her to develop and refine her innovative ideas.
Collaborations
Sheila has collaborated with talented individuals such as Anis Zribi and Ayan Banerjee. These partnerships have contributed to her success and the advancement of her projects.
Conclusion
Sheila Tandon is a remarkable inventor whose work in barrier coatings and semiconductor technologies continues to influence the industry. Her innovative patents and collaborations highlight her dedication to advancing technology.