Shawn D Hancock

Title: Innovations of Shawn D Hancock

Introduction

Shawn D Hancock is a notable inventor based in Alviso, CA (US). He has made significant contributions to the field of chemical vapor deposition, particularly in the development of ashable hard mask films. With a total of 5 patents to his name, Hancock's work has advanced the technology used in various substrate applications.

Latest Patents

Hancock's latest patents focus on methods of depositing smooth and conformal ashable hard mask films. These methods utilize plasma enhanced chemical vapor deposition techniques that involve precursors with high carbon to hydrogen (C:H) ratios, such as acetylene. The processes are designed to achieve smooth ashable hard mask films using high frequency radio frequency-generated plasmas, which operate without low frequency components and at relatively high pressures. His innovations also emphasize good selectivity and improved side wall coverage and roughness in the deposition process.

Career Highlights

Shawn D Hancock is currently associated with Novellus Systems Incorporated, where he continues to push the boundaries of innovation in his field. His expertise in plasma deposition methods has positioned him as a key figure in the development of advanced materials for various applications.

Collaborations

Hancock has collaborated with notable colleagues, including Edward J McInerney and Thomas M Pratt. These partnerships have contributed to the successful development and implementation of his patented technologies.

Conclusion

Shawn D Hancock's contributions to the field of chemical vapor deposition and his innovative methods for depositing ashable hard mask films highlight his importance as an inventor. His work continues to influence advancements in substrate technology and materials science.