Shaurakar Das

Title: Innovations by Shaurakar Das

Introduction

Shaurakar Das is an accomplished inventor based in Santa Clara, California. He has made significant contributions to the field of integrated circuits, holding two patents that showcase his expertise and innovative thinking.

Latest Patents

One of his latest patents is focused on "Rail power density aware standard cell placement for integrated circuits." This invention addresses the critical need to maintain a minimum potential difference between high and low power supply rails in integrated circuits. The patent highlights the issue of IR drop, which occurs when the switching activity of cells sharing a power supply rail exceeds the available power at a given time. To combat this, Das's approach involves reorganizing the placement of cells within bounding box regions before fabrication. By normalizing power density across the power rails based on the spatial and temporal characteristics of each cell, his method minimizes the impact on timing and mitigates IR drop. This innovative reorganization effectively distributes current consumption between supply rails, reducing current spikes and enhancing overall circuit performance.

Career Highlights

Shaurakar Das is currently employed at Nvidia Corporation, a leading technology company known for its advancements in graphics processing and artificial intelligence. His work at Nvidia has allowed him to apply his innovative ideas in a practical setting, contributing to the development of cutting-edge technologies.

Collaborations

Das collaborates with talented coworkers, including Haoxing Ren and Santosh Santosh. Their combined expertise fosters a creative environment that drives innovation and enhances the quality of their projects.

Conclusion

Shaurakar Das is a notable inventor whose work in integrated circuits has led to significant advancements in technology. His patents reflect a deep understanding of electrical engineering principles and a commitment to improving circuit performance. His contributions continue to influence the field and inspire future innovations.