This inventor holds 4 USPTO granted patents. Top assignees: Alluxa, Inc., Other. Active years: 2017-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017-2024
Title: Shaun Frank Mccaffery: Innovator in Sputtering Technology
Introduction
Shaun Frank Mccaffery is a notable inventor based in Healdsburg, CA (US). He has made significant contributions to the field of sputtering technology, holding a total of 4 patents. His work focuses on advanced systems that enhance the efficiency and effectiveness of sputtering processes.
Latest Patents
One of Shaun's latest patents is for a "Sputtering system with a plurality of cathode assemblies." This innovative magnetron sputtering system features a substrate mounted within a vacuum chamber. It includes a plurality of cathode assemblies, which are divided into a first set and a second set, configured for reactive sputtering. Each cathode assembly comprises a target made of sputterable material, with an at least partially exposed planar sputtering surface. The target support is designed to hold the target in the vacuum chamber and rotate it about a target axis. Additionally, a magnetic field source with a magnet array is included. The cathode assemblies controller assembly can actuate the first set of cathode assemblies independently of the second set, and vice versa.
Career Highlights
Throughout his career, Shaun has worked with various companies, including Alluxa, Inc. His experience in the industry has allowed him to develop and refine his innovative ideas, contributing to advancements in sputtering technology.
Collaborations
Shaun has collaborated with notable professionals in his field, including his coworker Michael A Scobey. These collaborations have further enriched his work and led to the development of cutting-edge technologies.
Conclusion
Shaun Frank Mccaffery is a distinguished inventor whose work in sputtering technology has made a significant impact. His innovative patents and collaborations highlight his dedication to advancing the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile