Location History:
- Carnas, WA (US) (2014)
- Camas, WA (US) (2016)
Company Filing History:
Years Active: 2014-2016
Title: Innovations of Sharon Ying
Introduction
Sharon Ying is a notable inventor based in Camas, WA (US). She has made significant contributions to the field of semiconductor technology, particularly in the development of explosive device initiators. With a total of 2 patents, her work showcases her expertise and innovative spirit.
Latest Patents
One of Sharon Ying's latest patents is the Silicided MOS capacitor explosive device initiator. This invention utilizes a semiconductor explosion initiator device that features an MOS capacitor formed on a semiconductor substrate. The design includes a silicide layer over a doped silicon layer, which is situated above an oxide layer. The oxide layer is placed on an N-well within the semiconductor substrate. A voltage source applies a pulsed voltage across the MOS capacitor, leading to the avalanche breakdown of the oxide layer. This process facilitates the diffusion of metal from the silicide layer into the doped silicon of the N-well. The resulting chemical reaction generates a plasma that can ignite pyrotechnic materials or detonate other explosive materials in contact with the semiconductor explosion initiator device.
Career Highlights
Sharon Ying is currently employed at WaferTech, Inc., where she continues to innovate and develop advanced technologies. Her work has garnered attention in the semiconductor industry, and she is recognized for her contributions to explosive device technology.
Collaborations
Sharon collaborates with her coworker, Re-Long Chiu, to further enhance their research and development efforts in the field.
Conclusion
Sharon Ying's innovative work in semiconductor technology, particularly her patents related to explosive device initiators, highlights her significant contributions to the field. Her career at WaferTech, Inc. and collaborations with fellow inventors underscore her commitment to advancing technology.