The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2016

Filed:

Jul. 17, 2014
Applicant:

Wafertech, Llc, Camas, WA (US);

Inventors:

Re-Long Chiu, Vancouver, WA (US);

Sharon Ying, Camas, WA (US);

Assignee:

WAFERTECH, LLC, Camas, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F42D 1/045 (2006.01); F42B 3/10 (2006.01); F42B 3/13 (2006.01); F42C 19/12 (2006.01); F42C 19/08 (2006.01);
U.S. Cl.
CPC ...
F42D 1/045 (2013.01); F42B 3/10 (2013.01); F42B 3/13 (2013.01); F42C 19/0811 (2013.01); F42C 19/12 (2013.01);
Abstract

An explosive device using a semiconductor explosion initiator device provides an MOS capacitor formed on a semiconductor substrate and including a silicide layer formed over a doped silicon layer formed over an oxide layer. The oxide layer is formed on an N-well formed in a semiconductor substrate. A voltage source applies a voltage which may be a pulsed voltage, across the MOS capacitor sufficient to cause the avalanche breakdown of the oxide layer and the diffusion of metal from the silicide layer into the doped silicon of the N-well formed in the substrate. The chemical reaction between the metal and the doped silicon causes the generation of a plasma which ignites a pyrotechnic material or ignites or detonates other explosive material in contact with the semiconductor explosion initiator device.


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