Forest Park, IL, United States of America

Sharon M Ward

This inventor holds 1 USPTO granted patent. Top assignee: Schering Corporation. Active years: 1991.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Innovations by Sharon M Ward in Contact Lens Disinfection

Introduction

Sharon M Ward is a notable inventor based in Forest Park, IL (US). She has made significant contributions to the field of contact lens care, particularly through her innovative patent for a contact lens disinfecting system. Her work has the potential to enhance the safety and efficacy of contact lens usage.

Latest Patents

Sharon M Ward holds 1 patent for her invention titled "Contact lens disinfecting system." This system utilizes an N-alkyl-2-pyrrolidone as a microbicide to disinfect contact lenses. The invention improves upon prior art microbicides, such as chlorhexidine gluconate, by enhancing their efficacy with the addition of pyrrolidones. The suitable pyrrolidones for this invention are the C8-C20 N-alkyl-2-pyrrolidones, with octyl, decyl, or dodecyl being the preferred alkyl moieties. These pyrrolidones can be utilized in solution or made available as a water-soluble tablet.

Career Highlights

Sharon M Ward has worked with Schering Corporation, where she has been able to apply her innovative ideas in a professional setting. Her contributions to the company have been instrumental in advancing their product offerings in the field of eye care.

Collaborations

Some of her notable coworkers include Ben Gu and Kenneth E Bliznik. Their collaboration has likely contributed to the development and refinement of her innovative ideas.

Conclusion

Sharon M Ward's work in the field of contact lens disinfection showcases her innovative spirit and dedication to improving eye care. Her patent represents a significant advancement in the safety and effectiveness of contact lens usage.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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