Company Filing History:
Years Active: 2004
Title: The Innovative Contributions of Sharon M Szelag
Introduction
Sharon M Szelag is a notable inventor based in Lynnfield, MA (US). She has made significant contributions to the field of lithography through her innovative patent. Her work focuses on enhancing the precision and efficiency of repairing lithography masks, which are crucial in semiconductor manufacturing.
Latest Patents
Sharon holds a patent titled "Method and apparatus for repairing lithography masks using a charged particle beam system." This patent describes a method for repairing opaque defects in lithography masks by employing focused ion beam milling in at least two steps. The first step involves using a large pixel spacing to create multiple holes in the defect material, while the second step utilizes a closer pixel spacing to ensure a smooth floor on the milled area, extending to the edge of the defect. The use of an etch enhancing gas, such as bromine, is preferred during the second step to improve the repair process. She has 1 patent to her name.
Career Highlights
Sharon's career is marked by her dedication to advancing lithography technology. Her innovative approach to mask repair has positioned her as a key figure in her field. She works at FEI Company, where she continues to develop and refine techniques that enhance the capabilities of lithography systems.
Collaborations
Sharon has collaborated with notable colleagues, including David C Ferranti and J David Casey, Jr. These partnerships have contributed to her success and the advancement of technology in her area of expertise.
Conclusion
Sharon M Szelag's contributions to the field of lithography through her innovative patent demonstrate her commitment to improving semiconductor manufacturing processes. Her work continues to influence the industry and inspire future innovations.