Company Filing History:
Years Active: 2011
Title: Shari Li Xiaohong: Innovator in Ceramic and Hybrid Films
Introduction
Shari Li Xiaohong is a prominent inventor based in Richland, WA (US). She has made significant contributions to the field of materials science, particularly in the development of high purity low dielectric constant ceramic and hybrid ceramic films. Her innovative work has implications for semiconductor technology and other applications requiring advanced materials.
Latest Patents
Shari Li Xiaohong holds a patent for a "Method for producing high purity low dielectric constant ceramic and hybrid ceramic films." This invention focuses on the production of porous ceramic and hybrid ceramic films that serve as low dielectric constant interlayers in semiconductor interconnects. The invention emphasizes the importance of humidity treatments to enhance the mechanical integrity of these films while maintaining their porosity and dielectric properties. The efficacy of these treatments is demonstrated using surfactant-templated mesoporous silicate films. Additionally, the invention introduces a specific family of additives that improve the control of film porosity and quality, making it applicable to various cross-linked ceramic or hybrid ceramic films.
Career Highlights
Shari Li Xiaohong is associated with the Battelle Memorial Institute, where she continues to advance her research in ceramic materials. Her work has been recognized for its innovative approach to enhancing the performance of dielectric films, particularly in applications that require low dielectric constants.
Collaborations
Shari has collaborated with notable colleagues, including Jerome C. Birnbaum and Glen E. Fryxell. These collaborations have contributed to the depth and breadth of her research, fostering advancements in the field of materials science.
Conclusion
Shari Li Xiaohong's contributions to the development of ceramic and hybrid films represent a significant advancement in materials science. Her innovative methods and collaborative efforts continue to influence the semiconductor industry and beyond.
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