Sharang

Title: Innovations of Inventor Sharang in Semiconductor Technology

Introduction

Sharang is a notable inventor based in Brno, Czech Republic. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the etching processes used in semiconductor devices, which is crucial for various applications in electronics.

Latest Patents

Sharang holds a patent for a method of etching one or more mixed metal and dielectric layers of a semiconductor device. This method performs both planar and cross-sectional etching of semiconductor devices composed of multiple layers of dissimilar materials, such as metals and dielectrics. The technique aims to either expose a single layer of interest or cross-section several layers for applications including nanoprobing, circuit editing, and failure analysis. The process involves directing an ion beam toward a defined area on the semiconductor device in the presence of an etching agent. This results in the removal of portions of the mixed metal and dielectric layer, producing a recess with at least one substantially smooth and planar surface. The etching agent used contains oxidizing and reducing elements in an optimized ratio, ensuring that the quantity of oxidizing elements exceeds that of reducing elements by one.

Career Highlights

Throughout his career, Sharang has worked with prominent companies in the semiconductor industry. Notably, he has been associated with Tescan Brno, S.r.o. and Orsay Physics. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Sharang has collaborated with several professionals in his field, including Gregory Goupil and Jan Brulik. These collaborations have further enriched his work and have led to innovative solutions in semiconductor etching processes.

Conclusion

In summary, Sharang is a distinguished inventor whose contributions to semiconductor technology are noteworthy. His innovative patent and career experiences reflect his commitment to advancing the field.