Shaoqing Zhang

Title: Innovations of Shaoqing Zhang in Amorphous Carbon Films

Introduction

Shaoqing Zhang is an accomplished inventor based in Fremont, CA (US). He has made significant contributions to the field of materials science, particularly in the development of amorphous carbon films. His innovative work has led to advancements in semiconductor processing technologies.

Latest Patents

Shaoqing Zhang holds a patent for "High density, modulus, and hardness amorphous carbon films at low pressure." This patent describes methods and related apparatus for depositing an ashable hard mask (AHM) on a substrate in a low-pressure chamber using a dual frequency radio frequency component. The use of low-pressure plasma enhanced chemical vapor deposition increases the etch selectivity of the AHM, allowing for the application of a thinner AHM in semiconductor processing operations. He has 1 patent to his name.

Career Highlights

Shaoqing Zhang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has positioned him as a key player in the development of advanced materials for semiconductor applications.

Collaborations

Shaoqing has collaborated with notable colleagues, including Matthew Scott Weimer and Ragesh Puthenkovilakam. These collaborations have further enhanced the innovative capabilities within his field.

Conclusion

Shaoqing Zhang's contributions to the development of amorphous carbon films have made a significant impact on semiconductor processing technologies. His innovative approaches and collaborations continue to drive advancements in the industry.