This inventor holds 1 USPTO granted patent. Top assignee: Highlight Tech Corp.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Shao-qing Huang and Semiconductor Waste-Gas Treatment
Introduction
Shao-qing Huang is an inventor associated with Tainan, Taiwan, and Highlight Tech Corp. His patent work includes a system designed to separate moisture and dust from semiconductor process waste gas.
Latest Patents
Huang is credited with 1 patent: “Semiconductor Waste Gas Treatment System and Moisture-Gas Separator of the Same.” The invention describes a moisture-gas separator positioned between a wet scrubber and an air extraction device. Inside the separator, an inclined diversion partition and a filter-material layer help separate water mist and dust from scrubbed waste gas. The system then discharges the resulting dry waste gas through an exhaust pipe.
Career Highlights
Huang’s listed patent reflects work on equipment for treating semiconductor process emissions. The design combines wet scrubbing with a downstream separation stage to remove moisture and dust from the gas stream.
Collaborations
Huang’s listed coworkers include Ting Tsai and Zhi-Hao Chen. The patent information provided does not specify their individual roles in the invention.
Conclusion
Shao-qing Huang’s patent focuses on improving semiconductor waste-gas treatment through a moisture-and-dust separation system associated with Highlight Tech Corp.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile