Shant Arakelyan

Title: The Innovative Mind of Shant Arakelyan

Introduction

Shant Arakelyan is an accomplished inventor based in Cheonan-si, South Korea. With three patents to his name, he has made significant contributions to the field of substrate processing technology. His inventive concepts focus on enhancing the efficiency and effectiveness of substrate treatments through advanced apparatus and methods.

Latest Patents

Arakelyan's latest patents showcase groundbreaking technologies in substrate treating. One of his patents, titled "Substrate Treating Apparatus and Substrate Treating Method," presents an inventive concept that includes a process chamber with a treating space, a support unit for the substrate, a gas supply unit, and a plasma generation unit designed to create plasma from the process gas. This apparatus features a top electrode, a bottom electrode, and an edge electrode, all working in unison to improve substrate treatment processes.

Another noteworthy patent is the "Substrate Processing Apparatus and Method of Manufacturing Thereof." This technology features a process chamber that provides a dedicated space for substrate processing. Key components include a chuck member that supports the substrate, an edge electrode insulated from the chuck member, and an edge impedance controller that adjusts the electric potential of the edge electrode to optimize the substrate processing performance.

Career Highlights

Shant Arakelyan is currently associated with Semes Co., Ltd., a company known for its innovations in semiconductor manufacturing equipment. His work at Semes Co., Ltd. highlights his commitment to advancing substrate processing technology. The advancements brought about by his patents have the potential to significantly enhance manufacturing processes in various industries.

Collaborations

Arakelyan collaborates closely with talented coworkers, including Ja Myung Gu and Jamyung Gu. These partnerships foster an environment of innovation and efficiency, driving the development of new technologies and improving existing processes in semiconductor manufacturing.

Conclusion

Shant Arakelyan exemplifies the spirit of innovation, fueled by his extensive knowledge and experience in substrate processing technology. His contributions through patents and collaborative efforts are paving the way for advancements in the industry, ensuring higher standards and better processes for substrate treatments. As he continues to develop new technologies, the impact of his work is likely to resonate throughout the field for years to come.