Shankar W Chandran is a notable inventor based in Milpitas, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on improving processes related to semiconductor manufacturing, particularly in the deposition of films.

Latest Patents

One of his latest patents is titled "Method and apparatus for controlling dopant concentration during BPSG film deposition to reduce nitride consumption." This invention outlines a method for controlling dopant concentration during the deposition of borophosphosilicate glass film on a semiconductor wafer. The process aims to reduce the consumption of nitride on the wafer by strategically introducing various sources into the reaction chamber.

Another significant patent is "Accelerated plasma clean," which describes a method for removing residue from a substrate processing chamber. This method involves flowing an inert gas into a remote plasma chamber to create a plasma, while also generating reactive fluorine species to effectively clean the substrate processing chamber.

Career Highlights

Shankar W Chandran is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His innovative approaches and patented technologies have contributed to advancements in semiconductor manufacturing processes.

Collaborations

He has collaborated with notable coworkers, including Ellie Y Yieh and Li-Qun Xia, who have also contributed to the field of semiconductor technology.

Conclusion

Shankar W Chandran's work exemplifies the spirit of innovation in the semiconductor industry. His patents and contributions continue to influence the development of advanced manufacturing techniques.

Profile summary based on public USPTO records.

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