Shanghua Wu

Title: The Innovative Contributions of Shanghua Wu

Introduction

Shanghua Wu is a notable inventor based in Irvine, California, recognized for his significant contributions to the field of semiconductor processing. With a total of two patents to his name, Wu has developed innovative solutions that enhance the performance and longevity of plasma processing components.

Latest Patents

Wu's latest patents include advancements in high lifetime consumable silicon nitride-silicon dioxide plasma processing components. One patent describes a method for increasing the mean time between cleans of a plasma etch chamber and extending the lifetimes of chamber parts. This method involves plasma etching semiconductor substrates while utilizing sintered silicon nitride components that are exposed to ion bombardment and/or ionized halogen gas. The components consist of high purity silicon nitride and a sintering aid of silicon dioxide. Another patent focuses on a method for reducing metallic contamination on silicon substrates during plasma processing, utilizing a plasma processing apparatus with sintered silicon nitride components. Additionally, Wu has developed a dense silicon carbide (SiC) material that includes boron, nitrogen, and oxygen as the only additives, which exhibits excellent insulating performance, making it suitable for applications in plasma etching chambers for semiconductor and integrated circuit manufacturing.

Career Highlights

Throughout his career, Shanghua Wu has worked with prominent companies in the semiconductor industry, including Ceradyne, Inc. and Lam Research Corporation. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and materials science.

Collaborations

Wu has collaborated with several professionals in his field, including Biljana Mikijelj and Travis R. Taylor. These collaborations have contributed to the advancement of technologies in semiconductor manufacturing.

Conclusion

Shanghua Wu's innovative patents and career achievements highlight his significant impact on the semiconductor industry. His work continues to influence the development of advanced materials and processing techniques, ensuring the ongoing evolution of technology in this critical field.