Shanghai, China

Shang Xi

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Casco Signal Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shang Xi. Retrieved from https://idiyas.com/inventor/shang-xi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Shang Xi

Introduction

Shang Xi is a notable inventor based in Shanghai, China. He has made significant contributions to the field of communication technology. His innovative approach has led to the development of a unique communication method that enhances data processing security and reliability.

Latest Patents

Shang Xi holds 1 patent for his invention titled "Communication method based on dual channels and RSSP-I, apparatus, electronic device and storage medium." This invention involves a method that includes initializing configuration data, loading independent configuration information on dual CPUs, sending messages according to the RSSP-I communication protocol, and receiving messages in the same manner. Compared to prior art, this invention guarantees improved security and reliability in data processing.

Career Highlights

Shang Xi is currently employed at Casco Signal Ltd., where he continues to innovate and develop new technologies. His work focuses on enhancing communication methods and devices, contributing to advancements in the industry.

Collaborations

Shang Xi collaborates with talented individuals such as Lintai Fu and Jianjin Jiang. Their teamwork fosters a creative environment that drives innovation and leads to successful projects.

Conclusion

Shang Xi's contributions to communication technology exemplify the impact of innovative thinking in enhancing data security and reliability. His work at Casco Signal Ltd. and his patent demonstrate his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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