Seoul, South Korea

Shang-seok Woo

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 1998-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shang-seok Woo. Retrieved from https://idiyas.com/inventor/shang-seok-woo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1998-1999

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2 patents (USPTO):Explore Patents

Title: Innovations by Shang-seok Woo

Introduction

Shang-seok Woo is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of technology, particularly in the area of wet etching methods. With a total of 2 patents to his name, Woo continues to push the boundaries of innovation.

Latest Patents

His latest patents include a wet etching station and a wet etching method adapted for utilizing the same. The wet etching station features a bath apparatus containing a chemical etchant. This bath apparatus is equipped with a plurality of cooling lines installed in the lower portion of the bath area. These cooling lines are designed to make contact with the chemical etchant, allowing for the uniform etching of large-diameter wafers.

Career Highlights

Shang-seok Woo is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in developing advanced technologies. His work has been instrumental in enhancing the efficiency and effectiveness of wet etching processes.

Collaborations

He has collaborated with notable colleagues, including Kwang-yul Lee and Jung-ho Kang, contributing to various innovative projects within the company.

Conclusion

Shang-seok Woo's contributions to the field of technology, particularly through his patents, highlight his role as a key innovator in the industry. His work continues to influence advancements in wet etching methods and technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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